The high kinetic inductance of niobium nitride (NbN) thin films can be used for an implementation of compact on-chip inductances in cryoelectronic circuits. Here, for the first time, we demonstrate the implementation of a hybrid superconducting technology that includes the fabrication of standard aluminum submicron Josephson junctions and the NbN atomic layer deposition process. As an example, we fabricated and characterized a single and array of Al Josephson junctions together with NbN interconnections. The main Al Josephson junction parameters as well as NbN superconducting properties are in a good agreement with the values obtained by our standard fabrication process. The combination of technological processes for the NbN layers with Al Josephson junction allows implementing a new generation of innovative superconducting devices for different applications.